Sanchez, Martha I. : rechercher sur Z-Library

Campagne de collecte 15 septembre 2024 – 1 octobre 2024 C'est quoi, la collecte de fonds?

Le plus grand référentiel d'articles scientifiques au monde. 70,000,000+ d'articles gratuitement.

Campagne de collecte 15 septembre 2024 – 1 octobre 2024

Z-Library est une des plus grandes bibliothèques en ligne dans le monde, avec le stockage de plus de 17,000,000 livres et plus de 84,837,000 articles. Nous encourageons l'accès libre de chacun à la littérature. Aujourd'hui (15 septembre 2024) nous faisons un appel de fonds à tous ceux qui veulent contribuer encore plus au soutien et au développement de notre projet.

Les téléchargements SANS LIMITE sont aussi (au cours de 31 jours après la date de don) disponibles pour TOUS les utilisateurs qui soient en mesure de soutenir le projet pendant la période de collecte de fonds jusqu'au 1 octobre 2024.

C'est quoi, la collecte de fonds?En savoir plus

Livres
Articles (500+)
Les plus populaires
Liste
- Liste
- Tableau

1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Improving scanner wafer alignment performance by target optimization

Sanchez, Martha I., Ukraintsev, Vladimir A., Leray, Philippe, Jehoul, Christiane, Socha, Robert, Menchtchikov, Boris, Raghunathan, Sudhar, Kent, Eric, Schoonewelle, Hielke, Tinnemans, Patrick, Tuffy,

Année:

2016

Langue:

english

Fichier:

PDF, 871 KB

english, 2016

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Improving full-wafer on-product overlay using computationally designed process-robust and device-like metrology targets

Cain, Jason P., Sanchez, Martha I., Kim, Young-Sik, Hwang, Young-Sun, Jung, Mi-Rim, Yoo, Ji-Hwan, Kwon, Won-Taik, Ryan, Kevin, Tuffy, Paul, Zhang, Youping, Park, Sean, Oh, Nang-Lyeom, Park, Chris, Sha

Année:

2015

Langue:

english

Fichier:

PDF, 1.10 MB

english, 2015

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Investigating SEM metrology effects using a detailed SEM simulation and stochastic resist model

Cain, Jason P., Sanchez, Martha I., Lawson, Richard A., Henderson, Clifford L.

Année:

2015

Langue:

english

Fichier:

PDF, 2.36 MB

english, 2015

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Sensitivity study and parameter optimization of OCD tool for 14nm finFET process

Sanchez, Martha I., Ukraintsev, Vladimir A., Zhang, Zhensheng, Chen, Huiping, Cheng, Shiqiu, Zhan, Yunkun, Huang, Kun, Shi, Yaoming, Xu, Yiping

Année:

2016

Langue:

english

Fichier:

PDF, 1.77 MB

english, 2016

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Modeling ellipsometric measurement of novel 3D structures with RCWA and FEM simulations

Sanchez, Martha I., Ukraintsev, Vladimir A., O'Mullane, Samuel, Keller, Nick, Diebold, Alain C.

Année:

2016

Langue:

english

Fichier:

PDF, 1.04 MB

english, 2016

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Precise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography

Cain, Jason P., Sanchez, Martha I., Okai, Nobuhiro, Lavigne, Erin, Hitomi, Keiichiro, Halle, Scott, Hotta, Shoji, Koshihara, Shunsuke, Petrillo, Karen, Yamaguchi, Atsuko, Tanaka, Junichi, Bailey, Todd

Année:

2014

Langue:

english

Fichier:

PDF, 1.87 MB

english, 2014

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Metrology of advanced N14 process pattern split at lithography

Cain, Jason P., Sanchez, Martha I., Tzai, Wei-Jhe, Lin, Chia-Ching, Chen, Chien-Hao, Yu, Chun Chi, Chu, Wei-Yuan, Yoo, Sungchul, Huang, Chien-Jen, Cheng, Chao-Yu, Su, Hsiao-Fei

Année:

2014

Langue:

english

Fichier:

PDF, 600 KB

english, 2014

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Sidewall roughness and line profile measurement of photoresist and finFET features by cross-section STEM and TEM image for reference metrology

Cain, Jason P., Sanchez, Martha I., Takamasu, Kiyoshi, Okitou, Haruki, Takahashi, Satoru, Inoue, Osamu, Kawada, Hiroki, Kamineni, Vimal, Paul, Abhijeet, Bello, A. F.

Année:

2014

Langue:

english

Fichier:

PDF, 311 KB

english, 2014

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - New alignment mark design structures for higher diffraction order wafer quality enhancement

Sanchez, Martha I., Ukraintsev, Vladimir A., Zhang, Libin, Feng, Yaobin, Dong, Lisong, Su, Xiaojing, Tian, Zhengguo, Fang, Chao, Wei, Yayi, Ye, Tianchun

Année:

2017

Langue:

english

Fichier:

PDF, 675 KB

english, 2017

10

Bioactive compounds and antioxidant activity of papaya inoculated with Colletotrichum gloeosporioides as affected by hot water-calcium chloride

Ayón-Reyna, Lidia Elena, Delgado-Vargas, Francisco, Soltero-Sánchez, Carlos Andrés, López-Angulo, Gabriela, López-López, Martha Edith, López-Velázquez, Jordi Gerardo, Parra-Unda, Jesús Ricardo, Vega-G

Journal:

Journal of Food Biochemistry

Année:

2018

Langue:

english

Fichier:

PDF, 843 KB

english, 2018

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Comparative defect classifications and analysis of Lasertec's M1350 and M7360

Cain, Jason P., Sanchez, Martha I., Godwin, Milton, Balachandran, Dave, Tamura, Tomoya, Jia, Anwei

Année:

2014

Langue:

english

Fichier:

PDF, 3.34 MB

english, 2014

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - A novel method to quantify the complex mask patterns

Sanchez, Martha I., Ukraintsev, Vladimir A., Tung, Yu-Lung, Sun, Che-Yuan, Chuang, Shu-Chuan, Luo, Woei-Bin, Hu, Jia-Rui, Chen, Hsiang-Lin, Lin, Hua-Tai, Ke, Chih-Ming, Gau, Tsai-Sheng

Année:

2016

Langue:

english

Fichier:

PDF, 1.76 MB

english, 2016

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - In-line E-beam metrology and defect inspection: industry reflections, hybrid E-beam opportunities, recommendations and predictions

Sanchez, Martha I., Ukraintsev, Vladimir A., Solecky, Eric, Rasafar, Allen, Cantone, Jason, Bunday, Benjamin, Vaid, Alok, Patterson, Oliver, Stamper, Andrew, Wu, Kevin, Buengener, Ralf, Weng, Weihao,

Année:

2017

Langue:

english

Fichier:

PDF, 1.52 MB

english, 2017

14

Dimensión económica de la seguridad y la salud en el trabajo: una revisión de literatura

Riaño Casallas, Martha Isabel, Palencia-Sánchez, Francisco

Journal:

Gerencia y Políticas de Salud

Année:

2016

Fichier:

PDF, 963 KB

2016

15

Evidence for enkephalin- and endorphin-immunoreactive cells in the anterior pituitary of the axolotl Ambystoma mexicanum

Martha Leon-Olea, Marcela Sanchez-Alvarez, Ana Luisa Pĩa, Alejandro Bayon

Journal:

The Journal of Comparative Neurology

Année:

1991

Langue:

english

Fichier:

PDF, 1.18 MB

english, 1991

16

A theory for microtremor H/V spectral ratio: application for a layered medium

Francisco J. Sánchez-Sesma, Miguel Rodríguez, Ursula Iturrarán-Viveros, Francisco Luzón, Michel Campillo, Ludovic Margerin, Antonio García-Jerez, Martha Suarez, Miguel A. Santoyo, Alejandro Rodríguez-

Journal:

Geophysical Journal International

Année:

2011

Langue:

english

Fichier:

PDF, 223 KB

english, 2011

17

Between Heaven and Hell

Albert Sánchez Piñol and Martha Tennent

Journal:

World Literature Today

Année:

2009

Langue:

english

Fichier:

PDF, 622 KB

english, 2009

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Comparison study of diffraction-based overlay and image-based overlay measurements on programmed overlay errors

Sanchez, Martha I., Ukraintsev, Vladimir A., Gao, Haiyong, Chung, Woong Jae, Aung, Nyan, Subramany, Lokesh, Samudrala, Pavan, Gomez, Juan-Manuel

Année:

2016

Langue:

english

Fichier:

PDF, 873 KB

english, 2016

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Advanced in-line metrology strategy for self-aligned quadruple patterning

Sanchez, Martha I., Ukraintsev, Vladimir A., Chao, Robin, Breton, Mary, L'Herron, Benoit, Mendoza, Brock, Muthinti, Raja, Nelson, Florence, De La Pena, Abraham, Le, Fee li, Miller, Eric, Sieg, Stuart,

Année:

2016

Langue:

english

Fichier:

PDF, 1.22 MB

english, 2016

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Leveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes

Cain, Jason P., Sanchez, Martha I., Rana, Narender, Zhang, Yunlin, Kagalwala, Taher, Hu, Lin, Bailey, Todd

Année:

2014

Langue:

english

Fichier:

PDF, 1.76 MB

english, 2014

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Integrated production overlay field-by-field control for leading edge technology nodes

Cain, Jason P., Sanchez, Martha I., Chung, Woong Jae, Tristan, John, Gutjahr, Karsten, Subramany, Lokesh, Li, Chen, Sun, Yulei, Yelverton, Mark, Kim, Young Ki, Kim, Jeong Soo, Huang, Chin-Chou Kevin,

Année:

2014

Langue:

english

Fichier:

PDF, 2.88 MB

english, 2014

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Evaluation of lens heating effect in high transmission NTD processes at the 20nm technology node

Cain, Jason P., Sanchez, Martha I., Jeon, Bumhwan, Lee, Sam, Subramany, Lokesh, Li, Chen, Pal, Shyam, Meyers, Sheldon, Mehta, Sohan, Wei, Yayi, Cho, David R.

Année:

2014

Langue:

english

Fichier:

PDF, 252 KB

english, 2014

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Innovative fast technique for overlay accuracy estimation using archer self calibration (ASC)

Cain, Jason P., Sanchez, Martha I., Hsu, Simon C. C., Chen, Charlie, Yu, Chun Chi, Pai, Yuan Chi, Amit, Eran, Yap, Lipkong, Itzkovich, Tal, Tien, David, Huang, Eros, Kuo, Kelly T. L., Amir, Nuriel

Année:

2014

Langue:

english

Fichier:

PDF, 634 KB

english, 2014

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Asymmetry overlay correction for lithography processes

Sanchez, Martha I., Ukraintsev, Vladimir A., Chen, Ming-Jui, Yu, Chun-Chi, Weng, Tang Chun, Chang, C.-H., Chen, Charlie, Lin, Chia Ching, Lio, En Chuan, Yu, Chia Hsiang

Année:

2017

Langue:

english

Fichier:

PDF, 520 KB

english, 2017

25

Antioxidant, intestinal immune status and anti-inflammatory potential of Chenopodium ambrosioides L. in fish: In vitro and in vivo studies

Reyes-Becerril, Martha, Angulo, Carlos, Sanchez, Veronica, Vázquez-Martínez, Juan, López, Mercedes G.

Journal:

Fish & Shellfish Immunology

Année:

2019

Langue:

english

Fichier:

PDF, 1.39 MB

english, 2019

26

Feminicide: Theorizing Border Violence

Sánchez, Martha Idalia Chew

Journal:

Latin American Research Review

Année:

2014

Langue:

english

Fichier:

PDF, 299 KB

english, 2014

27

Effects of using recommended coping strategies on drinking outcome following a brief intervention

Rafaela Davila, Martha Sanchez-Craig, D. Adrian Wilkinson

Journal:

Année:

2000

Langue:

english

Fichier:

PDF, 124 KB

english, 2000

28

Medicinal potions used against infectious bowel diseases in Mayan traditional medicine

Marina Vera-Ku, Martha Méndez-González, Rosa Moo-Puc, Miguel Rosado-Vallado, Paulino Simá-Polanco, Roberto Cedillo-Rivera, Sergio R. Peraza-Sánchez

Journal:

Journal of Ethnopharmacology

Année:

2010

Langue:

english

Fichier:

PDF, 187 KB

english, 2010

29

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Simulation of AIMS measurements using rigorous mask 3D modeling

Cain, Jason P., Sanchez, Martha I., Chou, Chih-Shiang, Huang, Hsu-Ting, Chu, Fu-Sheng, Chu, Yuan-Chih, Huang, Wen-Chun, Liu, Ru-Gun, Gau, Tsai-Sheng

Année:

2015

Langue:

english

Fichier:

PDF, 767 KB

english, 2015

30

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Effect of resist components on image spreading during postexposure bake of chemically amplified resists

Hinsberg, William D., Houle, Frances A., Sanchez, Martha I., Morrison, Michael E., Wallraff, Gregory M., Larson, Carl E., Hoffnagle, John A., Brock, Phillip J., Breyta, Gregory, Houlihan, Francis M.

Année:

2000

Langue:

english

Fichier:

PDF, 3.00 MB

english, 2000

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Holistic approach using accuracy of diffraction-based integrated metrology to improve on-product performance, reduce cycle time, and cost at litho

Cain, Jason P., Sanchez, Martha I., Bhattacharyya, Kaustuve, den Boef, Arie, Jak, Martin, Zhang, Gary, Maassen, Martijn, Tijssen, Robin, Adam, Omer, Fuchs, Andreas, Zhang, Youping, Huang, Jacky, Coura

Année:

2015

Langue:

english

Fichier:

PDF, 1.76 MB

english, 2015

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Overlay improvement by exposure map based mask registration optimization

Cain, Jason P., Sanchez, Martha I., Shi, Irene, Guo, Eric, Chen, Ming, Lu, Max, Li, Gordon, Li, Rivan, Tian, Eric

Année:

2015

Langue:

english

Fichier:

PDF, 3.97 MB

english, 2015

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Lithography overlay control improvement using patterned wafer geometry for sub-22nm technology nodes

Cain, Jason P., Sanchez, Martha I., Peterson, Joel, Rusk, Gary, Veeraraghavan, Sathish, Huang, Kevin, Koffas, Telly, Kimani, Peter, Sinha, Jaydeep

Année:

2015

Langue:

english

Fichier:

PDF, 778 KB

english, 2015

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - HVM capabilities of CPE run-to-run overlay control

Cain, Jason P., Sanchez, Martha I., Subramany, Lokesh, Chung, Woong Jae, Gutjahr, Karsten, Garcia-Medina, Miguel, Sparka, Christian, Yap, Lipkong, Demirer, Onur, Karur-Shanmugam, Ramkumar, Riggs, Bren

Année:

2015

Langue:

english

Fichier:

PDF, 877 KB

english, 2015

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Methodology for determining CD-SEM measurement condition of sub-20nm resist patterns for 0.33NA EUV lithography

Cain, Jason P., Sanchez, Martha I., Okai, Nobuhiro, Lavigne, Erin, Hitomi, Keiichiro, Halle, Scott, Hotta, Shoji, Koshihara, Shunsuke, Tanaka, Junichi, Bailey, Todd

Année:

2015

Langue:

english

Fichier:

PDF, 726 KB

english, 2015

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET)

Cain, Jason P., Sanchez, Martha I., Chen, Kai-Hsiung, Huang, GT, Chen, KS, Hsieh, C. W., Chen, YC, Ke, CM, Gau, TS, Ku, YC, Bhattacharyya, Kaustuve, Huang, Jacky, den Boef, Arie, v. d. Schaar, Maurits

Année:

2014

Langue:

english

Fichier:

PDF, 3.27 MB

english, 2014

37

The V-Girls: A Conversation with October

Martha Baer, Erin Cramer, Jessica Chalmers, Andrea Fraser, Marianne Weems, Herb Rorhback, Werner Sanchez, Pip Winthrop and Raul

Journal:

Année:

1989

Langue:

english

Fichier:

PDF, 2.38 MB

english, 1989

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Studying post-etching silicon crystal defects on 300mm wafer by automatic defect review AFM

Sanchez, Martha I., Ukraintsev, Vladimir A., Zandiatashbar, Ardavan, Taylor, Patrick A., Kim, Byong, Yoo, Young-kook, Lee, Keibock, Jo, Ahjin, Lee, Ju Suk, Cho, Sang-Joon, Park, Sang-il

Année:

2016

Langue:

english

Fichier:

PDF, 979 KB

english, 2016

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Multiple height calibration reference for nano-metrology

Cain, Jason P., Sanchez, Martha I., Christophersen, M., Phlips, B. F., Boudreau, A. J., Yetzbacher, M. K.

Année:

2015

Langue:

english

Fichier:

PDF, 682 KB

english, 2015

40

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Qmerit-calibrated overlay to improve overlay accuracy and device performance

Cain, Jason P., Sanchez, Martha I., Ullah, Md Zakir, Jazim, Mohamed Fazly Mohamed, Sim, Stella, Lim, Alan, Hiem, Biow, Chuen, Lieu Chia, Ang, Jesline, Lim, Ek Chow, Klein, Dana, Amit, Eran, Volkovitch

Année:

2015

Langue:

english

Fichier:

PDF, 749 KB

english, 2015

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Overlay optimization for 1x node technology and beyond via rule based sparse sampling

Sanchez, Martha I., Ukraintsev, Vladimir A., Aung, Nyan L., Chung, Woong Jae, Subramany, Lokesh, Hussain, Shehzeen, Samudrala, Pavan, Gao, Haiyong, Hao, Xueli, Chen, Yen-Jen, Gomez, Juan-Manuel

Année:

2016

Langue:

english

Fichier:

PDF, 1.41 MB

english, 2016

42

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Co-optimization of RegC ® and TWINSCAN TM corrections to improve the intra-field on-product overlay performance

Sanchez, Martha I., Ukraintsev, Vladimir A., Gorhad, Kujan, Sharoni, Ofir, Dmitriev, Vladimir, Cohen, Avi, van Haren, Richard, Roelofs, Christian, Cekli, Hakki Ergun, Callagher, Emily, Leray, Philippe

Année:

2016

Langue:

english

Fichier:

PDF, 5.46 MB

english, 2016

43

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - High-speed AFM for 1x node metrology and inspection: Does it damage the features?

Cain, Jason P., Sanchez, Martha I., Sadeghian, Hamed, van den Dool, Teun C., Uziel, Yoram, Bar Or, Ron

Année:

2015

Langue:

english

Fichier:

PDF, 932 KB

english, 2015

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Metrology target design simulations for accurate and robust scatterometry overlay measurements

Sanchez, Martha I., Ukraintsev, Vladimir A., Ben-Dov, Guy, Tarshish-Shapir, Inna, Gready, David, Ghinovker, Mark, Adel, Mike, Herzel, Eitan, Oh, Soonho, Choi, DongSub, Han, Sang Hyun, El Kodadi, Moham

Année:

2016

Langue:

english

Fichier:

PDF, 972 KB

english, 2016

45

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process

Sanchez, Martha I., Ukraintsev, Vladimir A., Lorusso, Gian Francesco, Inoue, Osamu, Ohashi, Takeyoshi, Altamirano Sanchez, Efrain, Constantoudis, Vassilios, Koshihara, Shunsuke

Année:

2016

Langue:

english

Fichier:

PDF, 992 KB

english, 2016

46

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - DSA via hole shrink for advanced node applications

Bencher, Christopher, Cheng, Joy Y., Chi, Cheng, Liu, Chi-Chun, Meli, Luciana, Schmidt, Kristin, Xu, Yongan, de Silva, Ekmini Anuja, Sanchez, Martha I., Farrell, Richard A., Cottle, Hongyun, Kawamura,

Année:

2016

Langue:

english

Fichier:

PDF, 780 KB

english, 2016

47

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Holistic lithography and metrology's importance in driving patterning fidelity

Sanchez, Martha I., Ukraintsev, Vladimir A., van den Brink, Martin

Année:

2016

Langue:

english

Fichier:

PDF, 5.25 MB

english, 2016

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - New approaches in diffraction based optical metrology

Sanchez, Martha I., Ukraintsev, Vladimir A., Ebert, M., Vanoppen, P., Jak, M., v. d. Zouw, G., Cramer, H., Nooitgedagt, T., v. d. Laan, H.

Année:

2016

Langue:

english

Fichier:

PDF, 3.48 MB

english, 2016

49

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Integrated ADI optical metrology solution for lithography process control of CD and OV

Cain, Jason P., Sanchez, Martha I., Strobl, Marlene, Tsai, Wilhelm, Lan, Andy, Chen, Tom, Hsu, Wilson, Chen, Henry, Liang, Frida, Wang, Alan, Hung, Platt, Huang, David, Chiu, Ethan, Yu, Paul, Song, Yi

Année:

2014

Langue:

english

Fichier:

PDF, 2.48 MB

english, 2014

50

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Holistic overlay control for multi-patterning process layers at the 10nm and 7nm nodes

Sanchez, Martha I., Ukraintsev, Vladimir A., Verstappen, Leon, Mos, Evert, Wardenier, Peter, Megens, Henry, Schmitt-Weaver, Emil, Bhattacharyya, Kaustuve, Adam, Omer, Grzela, Grzegorz, van Heijst, Joo

Année:

2016

Langue:

english

Fichier:

PDF, 1.42 MB

english, 2016